Nanoscale Topography: New Method of Etching Semiconductors Increases Precision - Illinois Media Space

Nanoscale Topography: New Method of Etching Semiconductors Increases Precision

From Joel Steinfeldt

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Watch a demonstration of a new optical method of etching semiconductors.

For more information:

http://www.nature.com/lsa/index.html

http://light.ece.illinois.edu/

http://psl.mntl.illinois.edu/

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